Regular Fabrics in Deep Sub-Micron Integrated-Circuit Design 53 Ursache des Wollens
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Ursache des Wollens
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Regular Fabrics in Deep Sub-Micron Integrated-Circuit Design 53 Ursache des WollensRegular Fabrics in Deep Sub Micron Integrated Circuit Design discusses new approaches to better timing closure and manufacturability of DSM Integrated Circuits. The key idea presented is the use of regular circuit and interconnect structures such that area delay can be predicted with high accuracy. The co design of structures and algorithms allows great opportunities for achieving better final results, thus closing the gap between IC and CAD
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